JPH0119448B2 - - Google Patents

Info

Publication number
JPH0119448B2
JPH0119448B2 JP60271144A JP27114485A JPH0119448B2 JP H0119448 B2 JPH0119448 B2 JP H0119448B2 JP 60271144 A JP60271144 A JP 60271144A JP 27114485 A JP27114485 A JP 27114485A JP H0119448 B2 JPH0119448 B2 JP H0119448B2
Authority
JP
Japan
Prior art keywords
metal
rare earth
iron group
temperature
molded body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60271144A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62130235A (ja
Inventor
Kenichi Hijikata
Kazuyuki Sato
Hitoshi Maruyama
Ryoko Furuhashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP60271144A priority Critical patent/JPS62130235A/ja
Publication of JPS62130235A publication Critical patent/JPS62130235A/ja
Publication of JPH0119448B2 publication Critical patent/JPH0119448B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP60271144A 1985-12-02 1985-12-02 タ−ゲツト材の製造方法 Granted JPS62130235A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60271144A JPS62130235A (ja) 1985-12-02 1985-12-02 タ−ゲツト材の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60271144A JPS62130235A (ja) 1985-12-02 1985-12-02 タ−ゲツト材の製造方法

Publications (2)

Publication Number Publication Date
JPS62130235A JPS62130235A (ja) 1987-06-12
JPH0119448B2 true JPH0119448B2 (en]) 1989-04-11

Family

ID=17495932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60271144A Granted JPS62130235A (ja) 1985-12-02 1985-12-02 タ−ゲツト材の製造方法

Country Status (1)

Country Link
JP (1) JPS62130235A (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02130650U (en]) * 1989-03-31 1990-10-29
JPH02149251U (en]) * 1989-05-17 1990-12-19
JPH0313153U (en]) * 1989-06-22 1991-02-08

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0768611B2 (ja) * 1986-08-20 1995-07-26 日立金属株式会社 スパツタリング用合金タ−ゲツトの製造方法
JPS6431966A (en) * 1987-07-25 1989-02-02 Tokin Corp Alloy target material and its production
JP2692139B2 (ja) * 1988-05-27 1997-12-17 セイコーエプソン株式会社 スパッタリングターゲットの製造方法
JPH079060B2 (ja) * 1988-02-25 1995-02-01 株式会社トーキン 光磁気記録媒体用ターゲットの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02130650U (en]) * 1989-03-31 1990-10-29
JPH02149251U (en]) * 1989-05-17 1990-12-19
JPH0313153U (en]) * 1989-06-22 1991-02-08

Also Published As

Publication number Publication date
JPS62130235A (ja) 1987-06-12

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